Development of metal organic cluster EUV photoresists

Kazunori Sakai; Seok Heon Jung; Wenyang Pan; Emmanuel P. Giannelis; Christopher K. Ober

doi:10.1117/12.2516133

25 March 2019 Development of metal organic cluster EUV photoresists

Kazunori Sakai, Seok Heon Jung, Wenyang Pan, Emmanuel P. Giannelis, Christopher K. Ober

Proceedings Volume 10960, Advances in Patterning Materials and Processes XXXVI; 1096015 (2019) https://doi.org/10.1117/12.2516133
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

Extreme ultraviolet (EUV) lithography, using 13.5 nm radiations, is almost ready for high volume manufacturing. EUV lithography is expected to be the main technology for manufacturing leading-edge devices and continuous improvement of lithography performance is still needed. We have developed several metal oxide containing resists and recently focused on metal organic cluster photoresists with controlled size distribution. In this paper, material properties and lithography performance of our new metal organic cluster photoresists are discussed.

Citation Download Citation

Kazunori Sakai, Seok Heon Jung, Wenyang Pan, Emmanuel P. Giannelis, and Christopher K. Ober "Development of metal organic cluster EUV photoresists", Proc. SPIE 10960, Advances in Patterning Materials and Processes XXXVI, 1096015 (25 March 2019); https://doi.org/10.1117/12.2516133

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