Blazed x-ray reflection gratings using electron-beam lithography and ion milling (Conference Presentation)

Drew M. Miles; Randall L. McEntaffer; Fabien Grise; Chad Eichfeld; Ross McCurdy

doi:10.1117/12.2514857

18 March 2019 Blazed x-ray reflection gratings using electron-beam lithography and ion milling (Conference Presentation)

Drew M. Miles, Randall L. McEntaffer, Fabien Grise, Chad Eichfeld, Ross McCurdy

Author Affiliations +

Proceedings Volume 10963, Advanced Etch Technology for Nanopatterning VIII; 109630U (2019) https://doi.org/10.1117/12.2514857
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

Astronomical X-ray diffraction gratings are a key technology under development for current and future NASA missions. X-ray reflection gratings, developed at Penn State University, have recently demonstrated both leading diffraction efficiency and high spectral resolving power. However, recent results are the result of different fabrication techniques and a single technique has not yet been developed to yield a grating that satisfies both the diffraction efficiency and resolving power required by future missions. Here we seek to leverage exiting electron-beam lithographic techniques to produce a grating with groove groove pattern capable of high resolving power. We then introduce new ion-milling techniques to create custom groove profiles capable of high diffraction efficiency. The goal is to produce a radial groove pattern with precisely blazed facets that are customizable based on ion mill input parameters. The process should be insensitive to groove density (ranging from ~150 nm to 400+ nm), facet size, and desired facet angle. Initial efforts in this study have concentrated on constraining various parameters in ion milling to fully characterize the effect of each parameter on the grating groove profile. We present here initial results and discuss experimental verification and future work.

Conference Presentation

Citation Download Citation

Drew M. Miles, Randall L. McEntaffer, Fabien Grise, Chad Eichfeld, and Ross McCurdy "Blazed x-ray reflection gratings using electron-beam lithography and ion milling (Conference Presentation)", Proc. SPIE 10963, Advanced Etch Technology for Nanopatterning VIII, 109630U (18 March 2019); https://doi.org/10.1117/12.2514857

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