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The papers in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. Additional papers and presentation recordings may be available online in the SPIE Digital Library at SPIEDigitalLibrary.org. The papers reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon. Please use the following format to cite material from these proceedings: Author(s), “Title of Paper,” in Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, edited by Akihiko Ando, Proceedings of SPIE Vol. 11178 (SPIE, Bellingham, WA, 2019) Seven-digit Article CID Number. ISSN: 0277-786X ISSN: 1996-756X (electronic) ISBN: 9781510630734 ISBN: 9781510630741 (electronic) Published by SPIE P.O. Box 10, Bellingham, Washington 98227-0010 USA Telephone +1 360 676 3290 (Pacific Time)· Fax +1 360 647 1445 Copyright © 2019, Society of Photo-Optical Instrumentation Engineers. Copying of material in this book for internal or personal use, or for the internal or personal use of specific clients, beyond the fair use provisions granted by the U.S. Copyright Law is authorized by SPIE subject to payment of copying fees. The Transactional Reporting Service base fee for this volume is $21.00 per article (or portion thereof), which should be paid directly to the Copyright Clearance Center (CCC), 222 Rosewood Drive, Danvers, MA 01923. Payment may also be made electronically through CCC Online at copyright.com. Other copying for republication, resale, advertising or promotion, or any form of systematic or multiple reproduction of any material in this book is prohibited except with permission in writing from the publisher. The CCC fee code is 0277-786X/19/$21.00. Printed in the United States of America by Curran Associates, Inc., under license from SPIE. Publication of record for individual papers is online in the SPIE Digital Library.
Paper Numbering: Proceedings of SPIE follow an e-First publication model. A unique citation identifier (CID) number is assigned to each article at the time of publication. Utilization of CIDs allows articles to be fully citable as soon as they are published online, and connects the same identifier to all online and print versions of the publication. SPIE uses a seven-digit CID article numbering system structured as follows:
AuthorsNumbers in the index correspond to the last two digits of the seven-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first five digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc. Akima, Shinji, 0D Akitani, Kousuke, 03 Aronstein, David L., 0H Arps, J., 0O Asano, Toshiya, 0I Badger, Karen, 0D Ballman, Katherine, 0H Bekman, Herman, 0E Bender, Markus, 0E Beyer, Dirk, 0R Biermanns-Föth, A., 0O Birnstein, Anka, 0D Broman, Par, 06 Brouns, Derk, 06 Bürgel, Christian, 0L Chen, Pai Chi, 0Q Cheng, Yung Feng, 0Q Chong, Nui, 02 de Rooij-Lohmann, Véronique, 0E Detavernier, Christophe, 0F Deutz, Alex, 0E de Zanger, Rory, 0E D’havé, Koen, 0R Ebeling, Rob, 0E Erdmann, Andreas, 0F Esashi, Masayoshi, 0B Evanschitzky, Peter, 0F Finders, Jo, 07 Frommhold, Andreas, 07 Fujii, Kenichi, 04 Fujimura, Aki, 09, 0A Gallagher, Emily, 07 Hayashi, Tatsuya, 0J Hayashi, Tomohiko, 0I Hendrickx, Eric, 0F Henry, Tania, 0G Hermans, Jan, 0R Heumann, Jan, 0D Hiura, Hiromi, 0I Hiura, Mitsuru, 0J Hönicke, Philipp, 0F Horiuchi, Toshiyuki, 03 Hsu, Yuan, 0M Huang, Chain Ting, 0Q Huang, Zack, 0M Ikegami, Naokatsu, 0B Imahashi, Kazumi, 03 Inoue, Koji, 04 Ip, Vincent, 0G Ishikawa, Akira, 0N Isogawa, Takeshi, 0D Iwanaga, Takehiko, 0I, 0J Iwasaki, Jun-ya, 03 Jonckheere, Rik, 0E Kagawa, Masayuki, 0D Kageyama, Kiyoshi, 08 Kawashima, Keisuke, 04 Kievit, Olaf, 0E Kobayashi, Hiroshi, 03 Kobayashi, Kota, 08 Kodera, Yutaka, 0D Kohmura, Kazuo, 04, 0N Kojima, Akira, 0B Komaki, Takamitsu, 0J Kono, Kenji, 0Q Kooiman, Marleen, 07 Koshida, Nobuyoshi, 0B Kubis, Michael, 07 Kulkarni, Parikshit, 08 Lafarre, Raymond, 06 Laubis, Christian, 0F Lebert, R., 0O LeClaire, Jeff, 0K Lee, Christopher, 0H Lee, Heng-Jen, 0M Lee, Meng, 0G Luong, Kim Vu, 0F Maas, Raymond, 06 Meyer, Mike, 0A Missalla, T., 0O Miyaguchi, Hiroshi, 0B Modderman, Theo, 06 Morohoshi, Hiroshi, 0J Mouraille, Orion, 0R Mulkens, Jan, 07 Murakami, Kouichi, 05 Nagai, Kazunori, 0Q Nakayama, Takahiro, 0I Nam, DS, 07 Nicolai, Kyri, 0E Niewczas, Mariusz, 09, 0A Notermans, Roel, 06 Oda, Takashi, 04 Ohyi, Hideyuki, 0B Ojima, Shuichi, 05 Okubo, Atsushi, 0N Ono, Yosuke, 0N Opsomer, Karl, 0F Pampfer, C., 0O Pang, Linyong (Leo), 09, 0A Pearman, Ryan, 09, 0A Phiesel, C., 0O Philipsen, Vicky, 0F Piel, C., 0O Preil, Moshe, 0C Rankin, Jed, 0D Resnick, Douglas J., 0I Rip, Jens, 0F Rispens, Gijsbert, 07 Robinson, Tod, 0K Rook, Katrina, 0G Sakai, Keita, 0I Salmaso, Guido, 06 Satou, Yutaka, 0M Scholze, Frank, 0E Sczyrba, Martin, 0L Shendre, Abhishek, 09, 0A Shirali, Nagesh, 09 Soltwisch, Victor, 0F Souriau, Laurent, 0F Srinivasan, Narasimhan, 0G Steinert, Steffen, 0R Sugata, Masanori, 0B Suzuki, Yuta, 03 Takabayashi, Yukio, 0I, 0J Tanaka, Hirofumi, 0N Toda, Yusuke, 0D Uemura, Takumi, 05 Ungar, Jeff, 09 Utzny, Clemens, 0L Vaenkatesan, Vidya, 07 Valadez, John, 08 van Adrichem, Paul, 07 van der Horst, Jan-Willem, 06 van Dijk, Leon, 0R van Haren, Richard, 0R van Look, Lieve, 07 van Putten, Michel, 0E van Veldhoven, Jacqueline, 0E Weng, Shang Feng, 0Q Westerhout, Jeroen, 0E Westphal, James W., 0C Wu, Chien-Ching, 0E Wu, Xin, 02 Yamamoto, Kiyohito, 0I Yanagida, Akira, 03 Yanagisawa, Kohei, 08 Yonetani, Masashi, 0D Yoshida, Itaru, 0D Zepka, Alex, 08 Zimmerman, John, 0H Conference CommitteeSymposium Chair
Advisory Committee Chair Advisory Committee
Organizing Committee Chair Organizing Committee Vice Chair Organizing Committee
Auditors
Steering Committee Chair Steering Committee Vice Chairs Steering Committee
Program Committee Chair Program Committee Vice Chairs
Program Committee
Session Chairs
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