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Variable filters are obtained upon the variation of the thickness of some or all the layers deposited on the substrate. The layers are deposited using a Bühler HELIOS machine in order to benefit from the high stability of the deposition process. To insure a non-uniformity of the deposited layers, adapted masks are placed in front of the targets for the low and high refractive index materials. The uniformity of these layers is measured via a custom set-up allowing a local measurement of the transmission to perform a mapping of the transmission over the whole component aperture. In this paper, we present the fabrication of layers and filters with variable thickness. Various types of thickness gradients are presented. |
Bandpass filters
Optical filters
Sputter deposition
Linear filtering
Niobium
Camera shutters
Plasma
