Large-area mask patterning for solar cell applications

Jingwen Hu; Jovan Maksimovic; Soon Hock Ng; Stefan Lundgaard; Yoshiaki Nishijima; Saulius Juodkazis

doi:10.1117/12.2541103

31 December 2019 Large-area mask patterning for solar cell applications

Jingwen Hu, Jovan Maksimovic, Soon Hock Ng, Stefan Lundgaard, Yoshiaki Nishijima, Saulius Juodkazis

Proceedings Volume 11201, SPIE Micro + Nano Materials, Devices, and Applications 2019; 112011K (2019) https://doi.org/10.1117/12.2541103
Event: ANZCOP, 2019, Melbourne, Australia

Abstract

Light harvesting using photonic crystal (PhC) surface patterns provides an opportunity to surpass the ray-optics defined light trapping and to approach thermodynamic ShockleyQueisser limit of solar cell efficiency, which for a single junction Si solar cell is ~ 32%. For an industry amenable nano-patterning of Si solar cells, we used laser direct write and stepper lithography based approaches for defining a large area (1 cm²) light trapping PhC patterns on silicon. Nanoholes of ~ 500 nm in diameter were fabricated by direct laser writing in a thin layer of chromium to act as a mask for subsequent reactive plasma etching to fabricate the nanostructures forming a PhC surface over a square centimeter. Surface area fabrication throughput was improved by more than order of magnitude as compared with electron beam lithography required to achieve sub-1 μm resolution.

Citation Download Citation

Jingwen Hu, Jovan Maksimovic, Soon Hock Ng, Stefan Lundgaard, Yoshiaki Nishijima, and Saulius Juodkazis "Large-area mask patterning for solar cell applications", Proc. SPIE 11201, SPIE Micro + Nano Materials, Devices, and Applications 2019, 112011K (31 December 2019); https://doi.org/10.1117/12.2541103

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