Excimer Laser With High Pulse Energy And Typical Applications

Heinz-Leonhard Jetter; Klaus-Joachim Schmatjko; Manfred Schroeder

doi:10.1117/12.961568

26 October 1989 Excimer Laser With High Pulse Energy And Typical Applications

Heinz-Leonhard Jetter, Klaus-Joachim Schmatjko, Manfred Schroeder

Proceedings Volume 1132, High Power Lasers and Laser Machining Technology; (1989) https://doi.org/10.1117/12.961568
Event: 1989 International Congress on Optical Science and Engineering, 1989, Paris, France

Abstract

The research program aims at scaling excimer lasers of high pulse energy (>2J) in output power. A XeC1 laser operated with paralleled waterline capacitors and a hollow cathode type X-ray gun has yielded 225 W at a pulse energy of > 2,25 J and a repetiton rate of 100 Hz. A short laser of 15 cm gain length was designed as a flexible tool for quick modification of components and for having more reserve in electrical power and gas throughput for scaling. So far with the short gain length and XeC1 0,56 J pulse energy were achieved. Applications of high pulse energy lasers focus on material processing. A Siemens XP 2020 excimer laser was used for structured removal of different coating/substrate systems of metals, ceramics and polymers, e. g. metal coating on ceramics, ceramic protection on steel, superconducting ceramic films on ceramics, polyimide on copper and metals sputtered on copper.

Citation Download Citation

Heinz-Leonhard Jetter, Klaus-Joachim Schmatjko, and Manfred Schroeder "Excimer Laser With High Pulse Energy And Typical Applications", Proc. SPIE 1132, High Power Lasers and Laser Machining Technology, (26 October 1989); https://doi.org/10.1117/12.961568

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