Presentation
20 August 2020 Metrology with atomic-scale localization errors by optical-image cross-correlation analysis
Tobias Frenzel, Julian Köpfler, Andreas Naber, Martin Wegener
Author Affiliations +
Abstract
Using superoscillations from a nanostructured Pancharatnam-Berry-phase metasurface serving as a marker, and four different polarization states of an incident laser, a recent paper (Science 364, 771 (2019)) reported 1nm localization errors at 800nm vacuum wavelength. Here, we show experimentally (unpublished) that digital optical-image cross-correlation analysis can achieve localization errors of 0.09nm with 12.5ms time resolution for similar marker footprints. Our approach uses incoherent unpolarized white light rather than a laser for illumination and works even for bare sample surfaces. Using time-harmonic modulation and synchronized stroboscopic illumination, we have taken nanometric movies at frequencies around 100kHz (Nature Commun. 10, 3384 (2019)).
Conference Presentation
© (2020) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tobias Frenzel, Julian Köpfler, Andreas Naber, and Martin Wegener "Metrology with atomic-scale localization errors by optical-image cross-correlation analysis", Proc. SPIE 11460, Metamaterials, Metadevices, and Metasystems 2020, 1146006 (20 August 2020); https://doi.org/10.1117/12.2566282
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KEYWORDS
Error analysis

Metrology

Laser marking

Modulation

Nanostructuring

Polarization

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