Titanium Nitride Antireflection Coating For Textured Polysilicon Solar Cells

P. Tiku; V. Ramamurthy

doi:10.1117/12.962182

12 December 1989 Titanium Nitride Antireflection Coating For Textured Polysilicon Solar Cells

P. Tiku, V. Ramamurthy

Proceedings Volume 1149, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion VIII; (1989) https://doi.org/10.1117/12.962182
Event: 33rd Annual Technical Symposium, 1989, San Diego, United States

Abstract

Suitability of sputter deposited titanium nitride as an antireflection coating on large area, textured polycrystalline silicon solar cells is examined. The TiN films deposited on solar cells are characterised for their thickness and refractive index using a Gaertner Ellipsometer. Measurements on solar cell out-put characteristics show an enhancement in the short-circuit current in the range of 12 - 25%. It is observed that even for an optimised TiN coating thickness, the number of reflecting grains on the textured surface of the polycrystalline silicon solar cells determine the current enhancement. Spectral response measurements indicate that apart from providing very good optical coupling, TiN film also effectively passivates the solar cell surface.

Citation Download Citation

P. Tiku and V. Ramamurthy "Titanium Nitride Antireflection Coating For Textured Polysilicon Solar Cells", Proc. SPIE 1149, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion VIII, (12 December 1989); https://doi.org/10.1117/12.962182

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