Ion beam lithography for coherent x-ray optics application

P. Medvedskaya; I. Lyatun; S. Shevyrtalov; M. Polikarpov; I. Snigireva; V. Yunkin; A. Snigirev

doi:10.1117/12.2568427

27 August 2020 Ion beam lithography for coherent x-ray optics application

P. Medvedskaya, I. Lyatun, S. Shevyrtalov, M. Polikarpov, I. Snigireva, V. Yunkin, A. Snigirev

Proceedings Volume 11491, Advances in X-Ray/EUV Optics and Components XV; 1149111 (2020) https://doi.org/10.1117/12.2568427
Event: SPIE Optical Engineering + Applications, 2020, Online Only

Conference Poster

Abstract

We demonstrate the capabilities of ion-beam lithography (IBL) for the manufacturing of the X-ray refractive micro-optics. For the first time with the help of IBL, the hardest of current materials – diamond – was milled, and microscale diamond half-lenses were produced. Lenses have a rotationally parabolic profile with radii of parabola apexes in the range from 3 to 10 μm. As has been confirmed with SEM, the surface of produced lenses was free of low- and high-frequency modulations: figure errors of fabricated lenses were < 200 nm, while the surface roughness was estimated to be 30 nm. The optical performance of the lens was successfully tested at a third-generation synchrotron, where the lenses provided diffraction-limited focusing of X-ray radiation and demonstrated intensity profiles with Gaussian distributions at every measured longitudinal position (along the optical axis) downstream of the optics.

Citation Download Citation

P. Medvedskaya, I. Lyatun, S. Shevyrtalov, M. Polikarpov, I. Snigireva, V. Yunkin, and A. Snigirev "Ion beam lithography for coherent x-ray optics application", Proc. SPIE 11491, Advances in X-Ray/EUV Optics and Components XV, 1149111 (27 August 2020); https://doi.org/10.1117/12.2568427

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