Uncertainty of figure error measurement by non-contact three dimensional nano-profiler using normal vector tracing method

Kota Hashimoto; Takeshi Ashizawa; Mikiya Ikuchi; Katsuyoshi Endo

doi:10.1117/12.2567841

21 August 2020 Uncertainty of figure error measurement by non-contact three dimensional nano-profiler using normal vector tracing method

Kota Hashimoto, Takeshi Ashizawa, Mikiya Ikuchi, Katsuyoshi Endo

Author Affiliations +

Proceedings Volume 11492, Advances in Metrology for X-Ray and EUV Optics IX; 1149206 (2020) https://doi.org/10.1117/12.2567841
Event: SPIE Optical Engineering + Applications, 2020, Online Only

Abstract

In recent years, optical elements with freeform or aspherical surface have been required in various fields. Nano-accuracy three-dimensional measurements are needed to make them. As general methods for measuring the surface shape of optical elements, there are CMM and interferometer. However, the uncertainty of CMM is about 100 nm. Further, the interferometer cannot perform absolute measurement, and it is difficult to evaluate uncertainty. Therefore, there is no method which can measure the shape of optical elements with nano-scale uncertainty. Then, we develop a non-contact three-dimensional figure error measurement method using normal vector tracing method. The principle of our method is that normal vectors at each measured point are decided by making the incident light beam on the mirror surface and the reflected beam at same point coincide. Our method has already achieved sub-nanometer repeatability. In this paper, we report the result of evaluating uncertainty of our measurement.

Conference Presentation

Citation Download Citation

Kota Hashimoto, Takeshi Ashizawa, Mikiya Ikuchi, and Katsuyoshi Endo "Uncertainty of figure error measurement by non-contact three dimensional nano-profiler using normal vector tracing method", Proc. SPIE 11492, Advances in Metrology for X-Ray and EUV Optics IX, 1149206 (21 August 2020); https://doi.org/10.1117/12.2567841

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