Today, one major obstacle for a broader impact and utilization of three-dimensional photonic-crystals (3D PC) is the lack of a scheme for low cost and large scale fabrication. In this work, we proposed a novel lithographic method to realize 3D PC that is inherently a low-cost and wafer-scale method. This method combines a 2D optical mask and off-axis double optical exposures to create 3D PCs having slanted rods and SP2 lattice symmetry. Three types of SP2 PC were successfully fabricated with a minimum feature size of d=1.5 micrometer over a large scale of 8x10 mm2, without any observable fabrication defects. The optical performances of the SP2 PCs were studied by FTIR reflectance measurements, indicating photonic band gap. Furthermore, this holographic method is ideal for creating a new class of slanted-rod based PC, such as topological PC in 3D, for new scientific discovery.
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