Paper
28 July 1989 Surface Roughness And Oxide Layers Of Sputtered Polycrystalline Films
R. Rohlsberger, M. Grote, U. Bergmann, E. Gerdau, R. Hollatz, R. Ruffer, H. D. Ruter, W. Sturhahn, M. Harsdorff, W. Pfutzner
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Abstract
The X-ray-optical performance of sputtered polycrystalline films in grazing incidence geometry is influenced by their surface roughness and the presence of oxide layers. The surface roughness of the films has been characterized by transmission electron microscopical ( TEM) techniques. A relation between the measured X- ray reflectivity and the microtopographic features seen in the TEM has been found. Rockingcurves of Ta- and Fe-films are influenced by oxide layers. Thin oxide layers produce an additional amplitude modulation in the reflectivity, from which the density and the thickness of the oxide layers can be derived with high accuracy.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
R. Rohlsberger, M. Grote, U. Bergmann, E. Gerdau, R. Hollatz, R. Ruffer, H. D. Ruter, W. Sturhahn, M. Harsdorff, and W. Pfutzner "Surface Roughness And Oxide Layers Of Sputtered Polycrystalline Films", Proc. SPIE 1160, X-Ray/EUV Optics for Astronomy and Microscopy, (28 July 1989); https://doi.org/10.1117/12.962624
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Cited by 4 scholarly publications.
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KEYWORDS
Oxides

Reflectivity

Silicon

Tantalum

Metals

Surface roughness

Palladium

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