High-speed in-line optical angular scatterometer for high-throughput roll-to-roll nanofabrication

Juan J. Faria-Briceno; Vineeth Sasidharan; Alexander Neumann; Shrawan Singhal; S. V. Sreenivasan; S. R. J. Brueck

doi:10.1117/12.2593730

22 February 2021 High-speed in-line optical angular scatterometer for high-throughput roll-to-roll nanofabrication

Juan J. Faria-Briceno, Vineeth Sasidharan, Alexander Neumann, Shrawan Singhal, S. V. Sreenivasan, S. R. J. Brueck

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Proceedings Volume 11610, Novel Patterning Technologies 2021; 116100F (2021) https://doi.org/10.1117/12.2593730
Event: SPIE Advanced Lithography, 2021, Online Only

Abstract

Roll-to-roll and other high-speed printing manufacturing processes are increasingly being extended to micro- and nano-electronics and photonics due to cost and throughput advantages as compared with traditional wafer-scale manufacturing. The extra degrees of freedom associated with a moving web require high speed, in-line metrology to control the manufacturing process. Many state-of-the-art metrology approaches have sub-10 nm resolution but cannot be implemented during real-time fabrication processes because of environmental constraints or contact/cross sectional requirements. Optical angular scatterometry is a non-contact metrology approach that can be implemented at high speed. We demonstrate a system that uses 45° off-axis parabolic mirrors and an 8kHz resonant scanner to vary the incident/reflected angle from ~17° to ~67°, suitable for nanoscale metrology at web speeds of up to 350 cm/s, well-beyond the speed of current manufacturing tools. Scatterometry is sensitive not only to gross defects (missing pattern sections) but also to variations in nanoscale pattern details, offering a pathway to feedback control of the manufacturing process.

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Juan J. Faria-Briceno, Vineeth Sasidharan, Alexander Neumann, Shrawan Singhal, S. V. Sreenivasan, and S. R. J. Brueck "High-speed in-line optical angular scatterometer for high-throughput roll-to-roll nanofabrication", Proc. SPIE 11610, Novel Patterning Technologies 2021, 116100F (22 February 2021); https://doi.org/10.1117/12.2593730

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