Self-registered self-assembly: a path to defect-free directed self-assembly with higher resolution gains

Lei Wan; Ricardo Ruiz

doi:10.1117/12.2584668

22 February 2021 Self-registered self-assembly: a path to defect-free directed self-assembly with higher resolution gains

Lei Wan, Ricardo Ruiz

Author Affiliations +

Proceedings Volume 11610, Novel Patterning Technologies 2021; 116100L (2021) https://doi.org/10.1117/12.2584668
Event: SPIE Advanced Lithography, 2021, Online Only

Abstract

Directed self-assembly (DSA) of block copolymer thin films remains a promising alternative to achieve the resolution gains needed to enable dense patterning with sub-10 nm critical dimensions (CD). Yet, some significant challenges remain. Among others, two challenges stand out: one relating to the thermodynamic and kinetic conditions that lead to finite defect densities while the second relates to a scalability challenge to harness simultaneous gains in both resolution metrics: minimum line width and minimum pitch. Here we present a self-registered self-assembly process that employs a two-step DSA to address both the energetics of defect formation and the scalability limitations to achieve simultaneous gains in both pitch and line width when compared to the guiding patterns.

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Lei Wan and Ricardo Ruiz "Self-registered self-assembly: a path to defect-free directed self-assembly with higher resolution gains", Proc. SPIE 11610, Novel Patterning Technologies 2021, 116100L (22 February 2021); https://doi.org/10.1117/12.2584668

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