The unavoidable renaissance of electron metrology in the age of high NA EUV

Gian Francesco Lorusso

doi:10.1117/12.2583828

22 February 2021 The unavoidable renaissance of electron metrology in the age of high NA EUV

Gian Francesco Lorusso

Proceedings Volume 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV; 1161127 (2021) https://doi.org/10.1117/12.2583828
Event: SPIE Advanced Lithography, 2021, Online Only

Abstract

Things are drastically changing in the field of metrology. The main reason for that is related to the daunting specification requirements for metrology imposed by high Numerical Aperture Extreme Ultraviolet Lithography (high NA EUVL). We observe a variety of new generation e-beam tools proliferating in imec unique ecosystem, from in-line Transmission Electron Microscope (TEM) to Voltage Contrast (VC) overlay tools, from Die To Database (D2DB) large area Scanning Electron Microscope (SEM) to high-voltage SEM, from Artificial Intelligence (AI)-based inspection tools to massive data acquisition e-beam system. We are facing a renaissance of e-beam metrology. In this paper, we are going to describe the challenges as well as the latest evolutionary developments of e-beam metrology in the semiconductor industry.

Conference Presentation

Citation Download Citation

Gian Francesco Lorusso "The unavoidable renaissance of electron metrology in the age of high NA EUV", Proc. SPIE 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV, 1161127 (22 February 2021); https://doi.org/10.1117/12.2583828

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