Presentation
5 March 2021 Dual-wavelength photo-killing of methicillin resistant staphylococcus aureus
Author Affiliations +
Abstract
Antimicrobial resistance is a concern to public health, with methicillin resistant Staphylococcus aureus (MRSA) being particularly important. Blue light at 405 nm has demonstrated efficacy for the treatment of localized infections. With respect to MRSA, aBL is not effective enough to be developed into a stand-alone therapy. Findings demonstrated the antioxidant properties of the S. aureus pigment, staphyloxanthin (STX). We hypothesized that the efficacy of 405 nm light on MRSA may improve with STX photolysis using 460 nm light. We report an approach that exploits the STX photolysis effect of 460 nm light to sensitize MRSA to 405 nm light.
Conference Presentation
© (2021) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Leon G. Leanse, Xueping Sharon Goh, Ji-Xin Cheng, David C. Hooper, and Tianhong Dai "Dual-wavelength photo-killing of methicillin resistant staphylococcus aureus", Proc. SPIE 11626, Photonic Diagnosis, Monitoring, Prevention, and Treatment of Infections and Inflammatory Diseases 2021, 116260T (5 March 2021); https://doi.org/10.1117/12.2577202
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KEYWORDS
Cell death

In vivo imaging

Oxygen

Photolysis

Skin

Organisms

Photomedicine

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