Roll-to-plate nanoimprint lithography for high volume production: equipment, materials, and processes

Jan Matthijs ter Meulen; Pim Veldhuizen; Sander Kommeren; Erhan Ercan; Gary Tam; Bram Titulaer

doi:10.1117/12.2583106

5 March 2021 Roll-to-plate nanoimprint lithography for high volume production: equipment, materials, and processes

Jan Matthijs ter Meulen, Pim Veldhuizen, Sander Kommeren, Erhan Ercan, Gary Tam, Bram Titulaer

Proceedings Volume 11696, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XIV; 116960R (2021) https://doi.org/10.1117/12.2583106
Event: SPIE OPTO, 2021, Online Only

Abstract

The interest for nanoimprint lithography (NIL) as enabling technology for applications in the field of photonics, solar, lighting and displays is growing. The quality, flexibility in design, the relative ease and competitive costs at which surfaces can be patterned makes NIL a groundbreaking technology. While the added value of imprinted light management crystallizes, the need for high-volume NIL production methods becomes more urgent. The Roll-to-Plate (R2P) imprint technology can enable mass volume production, having the opportunity for large area imprinting, manufacturing higher numbers of smaller products in a single imprint step. In this presentation the replication process and quality of the Morphotonics GEN5 R2P imprint equipment will be discussed.

Conference Presentation

Citation Download Citation

Jan Matthijs ter Meulen, Pim Veldhuizen, Sander Kommeren, Erhan Ercan, Gary Tam, and Bram Titulaer "Roll-to-plate nanoimprint lithography for high volume production: equipment, materials, and processes", Proc. SPIE 11696, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XIV, 116960R (5 March 2021); https://doi.org/10.1117/12.2583106

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