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5 March 2021 High performance MOCVD for micro LED applications
Ronald A. Arif, Soo Min Lee, Drew Hanser, Mark McKee, Eric Armour, Bumjoon Kim, Ajit Paranjpe, Bojan Mitrovic, Terry Toh
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Proceedings Volume 11706, Light-Emitting Devices, Materials, and Applications XXV; 1170613 (2021) https://doi.org/10.1117/12.2578842
Event: SPIE OPTO, 2021, Online Only
Abstract
Veeco MOCVD solutions are capable of supporting multiple substrates (GaAs, InP, sapphire, Si), and offer seamless transition to larger substrate sizes. For 6” GaAs red micro LED, Lumina® has demonstrated total population wavelength yield of >95% in 3 nm bin with defectivity <0.5 / cm2 @ >2um and 25% higher throughput than other platforms. For 6” sapphire miniLED, EPIK® has demonstrated within wafer wavelength 1sigma uniformity of 0.68nm (blue) / 1.24nm (green). For microLED on 200mm and 300mm silicon, Veeco has developed Propel® single wafer reactor for best in-class uniformity. Details of the technology and current data will be discussed.
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Ronald A. Arif, Soo Min Lee, Drew Hanser, Mark McKee, Eric Armour, Bumjoon Kim, Ajit Paranjpe, Bojan Mitrovic, and Terry Toh "High performance MOCVD for micro LED applications", Proc. SPIE 11706, Light-Emitting Devices, Materials, and Applications XXV, 1170613 (5 March 2021); https://doi.org/10.1117/12.2578842
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KEYWORDS
Photonics
Metalorganic chemical vapor deposition
Gallium arsenide
Sapphire
Semiconducting wafers
Silicon
Telecommunications
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