Paper
12 March 2021 Design and fabrication of silicon immersion grating
Author Affiliations +
Proceedings Volume 11763, Seventh Symposium on Novel Photoelectronic Detection Technology and Applications; 117638W (2021) https://doi.org/10.1117/12.2587632
Event: Seventh Symposium on Novel Photoelectronic Detection Technology and Application 2020, 2020, Kunming, China
Abstract
The immersion grating is one of the key components of the imaging spectrometer due to its high spectral resolution. The silicon immersion grating is conducive to the miniaturization and weight reduction of related satellite-borne instruments to reduce the launch cost of satellite payloads. This paper introduces the application of silicon immersion grating at home and abroad, its working principle and manufacturing methods. The symmetrical trapezoidal groove silicon immersion gratings with groove density of 200 lp/mm and 400 lp/mm were designed. The grating diffraction efficiency and polarization were analyzed by finite element analysis. The photoresist mask was fabricated by UV exposure and holographic exposure, and then the uniform arrays of V-shaped grating on a 2-inch Si substrate were achieved by reactive ion etching and wet etching. The measured results of groove parameters met the design requirements.
© (2021) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Zijiang Yang, Shiqi Pan, Qiao Pan, Quan Liu, Shaolong Wu, and Weimin Shen "Design and fabrication of silicon immersion grating", Proc. SPIE 11763, Seventh Symposium on Novel Photoelectronic Detection Technology and Applications, 117638W (12 March 2021); https://doi.org/10.1117/12.2587632
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