Paper
28 March 2022 Optimization of the dwell time point sampling step length for ion beam polishing
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Proceedings Volume 12169, Eighth Symposium on Novel Photoelectronic Detection Technology and Applications; 12169CU (2022) https://doi.org/10.1117/12.2627393
Event: Eighth Symposium on Novel Photoelectronic Detection Technology and Applications, 2021, Kunming, China
Abstract
In order to the dwell time function can be solved quickly and accurately, the sampling step length of the dwell point in the solution process of ion beam polishing dwell time has been optimized. Taking the PV value for per unit of uniform material removal and dwell time as the analysis object, the fluctuation caused of uniform removal and the total dwell time under different dwell time sampling step length are analyzed. The optimal dwell time sampling step length of ion beam polishing is 1.5σ。Using the determined sampling step length, the optical element with a diameter of 50mm is simulated polishing, and the surface PV value of the element decreases from 110.81nm to 20.06 nm. The optical element was polished by ion beam according to the simulation results, the PV value of the element surface decreased from 110.81nm to 46.46nm. The experimental results verify the effectiveness of the simulation results. Using the determined dwell point sampling step length, the dwell time can be solved quickly, and the PV value of the optical elements converges well.
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xu Zhang, Dasen Wang, Chaoxiang Xia, Xiaojing Li, Ning Pei, Hailin Guo, and Fengmin Nei "Optimization of the dwell time point sampling step length for ion beam polishing", Proc. SPIE 12169, Eighth Symposium on Novel Photoelectronic Detection Technology and Applications, 12169CU (28 March 2022); https://doi.org/10.1117/12.2627393
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KEYWORDS
Ion beams

Polishing

Surface finishing

Optical components

Optical simulations

Shape analysis

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