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We describe a metrology system allowing for the reduction of the errors caused by vibration of the production floor and allowing for measurements of the thickness of wafers in motion. This is accomplished by performing simultaneous measurements of spectra containing interference signals containing distance information using two or more probes positioned on both sides of the measured wafer on the same detector at the same time.
Wojtek J. Walecki
"Vibration insensitive fiber optic spectral interferometric probe for metrology of topography and thickness of multilayer samples", Proc. SPIE 12223, Interferometry XXI, 122230I (3 October 2022); https://doi.org/10.1117/12.2631783
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Wojtek J. Walecki, "Vibration insensitive fiber optic spectral interferometric probe for metrology of topography and thickness of multilayer samples," Proc. SPIE 12223, Interferometry XXI, 122230I (3 October 2022); https://doi.org/10.1117/12.2631783