Pulsed laser technology in microelectronics

Vladimir Michailovi Koleshko; A. V. Gulai

doi:10.1117/12.18489

1 June 1990 Pulsed laser technology in microelectronics

Vladimir Michailovi Koleshko, A. V. Gulai

Proceedings Volume 1225, High-Power Gas Lasers; (1990) https://doi.org/10.1117/12.18489
Event: OE/LASE '90, 1990, Los Angeles, CA, United States

Abstract

Laser processing methods have been widely used in microelectronics technology due to the following advantages: the zone of laser action can be decreased by focusing the beam into a small spot non-contact treatment eliminates undesirable introduction of impurities into laser-affected zone; the control of the energetic parameters and the spatial position of the treatment zone is relatively simple; laser treatment process is compatible with automatic control based on microprocessor systems. In this connection, the problem of laser radiation-substance interaction arises as well as the need for developing the technological processes ensuring high efficiency and quality of production, improvement of very large-scale integration (VLSI) parameters, and making products with unique characteristics.

Citation Download Citation

Vladimir Michailovi Koleshko and A. V. Gulai "Pulsed laser technology in microelectronics", Proc. SPIE 1225, High-Power Gas Lasers, (1 June 1990); https://doi.org/10.1117/12.18489

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available