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Selective laser etching (SLE) has demonstrated to be an effective technique to push further the exploitation of laser-based surface functionalisation techniques allowing to reach always smaller surface structures at higher resolution and with controlled aspect-ratios. In this work, SLE is investigated on sapphire as a method to induce different surface functionalities such as antireflective effect and wettability modification. The effect of laser process parameters on the etching rate is evaluated in Gaussian and Bessel laser-beam configurations for KOH etching solution by means of scanning electron microscope (SEM) and confocal microscope analyses.
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Quentin Broudissou, Laura Gemini, Marc Faucon, Rainer Kling, "Surface functionalisation of transparent materials by selective laser etching," Proc. SPIE 12408, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXVIII, 124080G (17 March 2023); https://doi.org/10.1117/12.2648737