Enhancement of overlay metrology accuracy by multi-wavelength scatterometry with rotated quadrupole illumination

Hyunsok Kim; Ikhyun Jeong; Baikkyu Hong; Sunouk Nam; Sumin Jang; Kangmin Lee; Hongpeng Su; Minho Jeong; Mingyu Kim; Hongcheon Yang; Wayne Zhou; Nanglyeom Oh; Dongsub Choi; Tal Yaziv; Hedvi Spielberg; Ohad Bachar; Rawi Dirawi

doi:10.1117/12.2657678

27 April 2023 Enhancement of overlay metrology accuracy by multi-wavelength scatterometry with rotated quadrupole illumination

Hyunsok Kim, Ikhyun Jeong, Baikkyu Hong, Sunouk Nam, Sumin Jang, Kangmin Lee, Hongpeng Su, Minho Jeong, Mingyu Kim, Hongcheon Yang, Wayne Zhou, Nanglyeom Oh, Dongsub Choi, Tal Yaziv, Hedvi Spielberg, Ohad Bachar, Rawi Dirawi

Author Affiliations +

Proceedings Volume 12496, Metrology, Inspection, and Process Control XXXVII; 1249620 (2023) https://doi.org/10.1117/12.2657678
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Abstract

As DRAM technology continues to evolve, advanced nodes shrink the device dimensions and raise the requirements for on-product overlay control to reduce residual error. Increased process complexity also demands tighter accuracy and robustness in metrology control, which necessitates new and innovative metrology enhancements and methods. Scatterometry-based overlay (SCOL®) metrology is a unique overlay metrology architecture that uses angle-resolved pupil imaging for overlay analysis and calculation. KLA’s SCOL metrology system offers wide-spectrum tunable laser and multi-wavelength (MWL) illumination patterns along with custom-designed advanced algorithms that provide multiple measurement conditions to meet unique layer and target requirements. This paper demonstrates improved overlay metrology accuracy and residual error on DRAM FEOL critical layer with SCOL technology. Multiwavelength and rotated quadrupole (RQ) illumination in the metrology tool are utilized to provide significantly improved residuals compared with the traditional single-wavelength (SWL) and on-axis illumination.

Conference Presentation

Citation Download Citation

Hyunsok Kim, Ikhyun Jeong, Baikkyu Hong, Sunouk Nam, Sumin Jang, Kangmin Lee, Hongpeng Su, Minho Jeong, Mingyu Kim, Hongcheon Yang, Wayne Zhou, Nanglyeom Oh, Dongsub Choi, Tal Yaziv, Hedvi Spielberg, Ohad Bachar, and Rawi Dirawi "Enhancement of overlay metrology accuracy by multi-wavelength scatterometry with rotated quadrupole illumination", Proc. SPIE 12496, Metrology, Inspection, and Process Control XXXVII, 1249620 (27 April 2023); https://doi.org/10.1117/12.2657678

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