Sequence-defined polypeptoid CARs for electron-beam and EUV lithography

Florian Kaefer; Christopher K. Ober; Zoey Meng; Rachel Segalman; Javier Read de Alaniz

doi:10.1117/12.2658413

30 April 2023 Sequence-defined polypeptoid CARs for electron-beam and EUV lithography

Florian Kaefer, Christopher K. Ober, Zoey Meng, Rachel Segalman, Javier Read de Alaniz

Proceedings Volume 12498, Advances in Patterning Materials and Processes XL; 1249817 (2023) https://doi.org/10.1117/12.2658413
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Abstract

Polymeric photoresists are limited in their sensitivity, resolution, and line-edge roughness due in large part to their molar mass distribution and variation in composition of single polymer chains. While most synthetic polymers, have monomer units distributed randomly along the polymer chain, polypeptoids are, however, characterized by low stochastics i.e., identical chains with extremely low chemical, structural, and molar mass variability with a widely adjustable length and composition. In this work we describe the synthesis of 10 repeat-unit polypeptoids designed as a photopolymer and demonstrate their potential as CARs evaluated by electron-beam, DUV and extreme-UV lithography, obtaining well defined line-space patterns of less than 30 nm half-pitch.

Conference Presentation

Citation Download Citation

Florian Kaefer, Christopher K. Ober, Zoey Meng, Rachel Segalman, and Javier Read de Alaniz "Sequence-defined polypeptoid CARs for electron-beam and EUV lithography", Proc. SPIE 12498, Advances in Patterning Materials and Processes XL, 1249817 (30 April 2023); https://doi.org/10.1117/12.2658413

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