Paper
20 September 2023 Parallel optics metrology using a Shack-Hartmann approach
Rakchanok Rungsawang, Rafael Porcar, Xavier Levecq, Nicolas Lefaudeux
Author Affiliations +
Abstract
We will present an innovative method for the measurement of Parallel Optics or optics with parallel surfaces, often planes such as windows, filters, and mirrors, but also potentially spherical in the case of domes. This new and patented approach solves issues related to the metrology of this type of sample, mainly associated with the signal reflected by the back surface of the substrate. Instead, and with no extra hardware or specific optical add-on making the testing more complicated and expensive, our implementation allows for a straightforward characterization of Parallel Optics with no manipulation of the sample, nor preparation of any kind. We will present the concept as well as its implementation and results obtained on samples as compared with other historic reference techniques.
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Rakchanok Rungsawang, Rafael Porcar, Xavier Levecq, and Nicolas Lefaudeux "Parallel optics metrology using a Shack-Hartmann approach", Proc. SPIE 12607, Optical Technology and Measurement for Industrial Applications Conference, 126070K (20 September 2023); https://doi.org/10.1117/12.3005549
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KEYWORDS
Wavefront sensors

Metrology

Optical surfaces

Reflection

Wafer-level optics

Wavefronts

Domes

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