Large-bandwidth deep-UV microscopy for CD metrology

Olivier Hignette; Janusz Woch; Laurence Gotti

doi:10.1117/12.20036

1 June 1990 Large-bandwidth deep-UV microscopy for CD metrology

Olivier Hignette, Janusz Woch, Laurence Gotti

Proceedings Volume 1261, Integrated Circuit Metrology, Inspection, and Process Control IV; (1990) https://doi.org/10.1117/12.20036
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

To adress the problems encountered when measuring subinicrons CD patterns with white light microscopy, an instrument using the ultraviolet spectrum around 280 urn has been designed and tested. The technologies developped for dealing simultaneously with ultraviolet, visible and infrared light are pnsented. The main advantage lies in the absorbance ofphotonsists, leading to simple optical proffles. Theontical results obtained with a modelling approach are iepoited along with experimental results characterized with respect to SEM cross sections.

Citation Download Citation

Olivier Hignette, Janusz Woch, and Laurence Gotti "Large-bandwidth deep-UV microscopy for CD metrology", Proc. SPIE 1261, Integrated Circuit Metrology, Inspection, and Process Control IV, (1 June 1990); https://doi.org/10.1117/12.20036

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