Fabrication of gratings on curved substrates using electron-beam lithography

Fabien Grisé; Casey DeRoo; Jake McCoy; Cecilia Fasano; Randall McEntaffer

doi:10.1117/12.2677795

6 October 2023 Fabrication of gratings on curved substrates using electron-beam lithography

Fabien Grisé, Casey DeRoo, Jake McCoy, Cecilia Fasano, Randall McEntaffer

Proceedings Volume 12679, Optics for EUV, X-Ray, and Gamma-Ray Astronomy XI; 126790K (2023) https://doi.org/10.1117/12.2677795
Event: SPIE Optical Engineering + Applications, 2023, San Diego, California, United States

Abstract

The next generation of reflection gratings for future high-energy space observatories need a high degree of customization. Making such gratings will require the use of increasingly complex nanofabrication techniques. One of the current challenges we are investigating is the precise patterning of grooves onto curved substrates. We report on our use of electron-beam lithography to fabricate gratings on cylindrical substrates, specifically designed to be tested for spectral resolution. We will discuss the steps involved and their hurdles, from the alignment of the substrate to the actual writing strategy.

Conference Presentation

Citation Download Citation

Fabien Grisé, Casey DeRoo, Jake McCoy, Cecilia Fasano, and Randall McEntaffer "Fabrication of gratings on curved substrates using electron-beam lithography", Proc. SPIE 12679, Optics for EUV, X-Ray, and Gamma-Ray Astronomy XI, 126790K (6 October 2023); https://doi.org/10.1117/12.2677795

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