Ion beam deposition for larger form-factor EUV mask blanks

Katrina Rook; Kenji Yamamoto; Mario Roque; Antonio Checco; Marjorie Chee; Meng H. Lee

doi:10.1117/12.2687706

21 November 2023 Ion beam deposition for larger form-factor EUV mask blanks

Katrina Rook, Kenji Yamamoto, Mario Roque, Antonio Checco, Marjorie Chee, Meng H. Lee

Proceedings Volume 12751, Photomask Technology 2023; 127510F (2023) https://doi.org/10.1117/12.2687706
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Abstract

EUV photomask blanks are coated with an ion-beam-deposited (IBD) multilayer mirror of Mo/Si,. IBD is further a candidate for pellicle processes, due to its low defect density and uniform coating. The within-mask uniformity requirement is currently +/- 0.015nm in Central Wavelength (CWL) across the 6” x 6” area., requiring film uniformity of ~ 0.1%. To avoid stitching under high-NA anamorphic projection, larger form-factor masks and pellicles are being considered. Proposals include 300mm round or 12” x 6” rectangular blanks. We present simulations and data for the uniformity performance of the Veeco ion beam deposition tool over the double-sized active area, namely a rectangle of 104 mm x 264 mm. We demonstrate that the non-uniformity of today’s processes-of-record could result in 3.3x higher nonuniformity over the extended area, implying a CWL uniformity of +/- 0.05 nm. We then demonstrate process and hardware modifications to enable CWL uniformity recovery to better than +/- 0.015 nm.

Conference Presentation

(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Katrina Rook, Kenji Yamamoto, Mario Roque, Antonio Checco, Marjorie Chee, and Meng H. Lee "Ion beam deposition for larger form-factor EUV mask blanks", Proc. SPIE 12751, Photomask Technology 2023, 127510F (21 November 2023); https://doi.org/10.1117/12.2687706

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