Paper
30 November 2023 Deposition of antireflective coatings on 3D micro-optics using atomic layer deposition
Author Affiliations +
Abstract
Laser 3D nanolithography enables the fabrication of complex shape micro-optical elements. The freedom of multi-surface designs of such components has cost them to suffer from reflection losses. This work presents the deposition of an Antireflective (AR) coating, using Atomic Layer Deposition (ALD), on hybrid organic-inorganic polymer SZ2080™ microstructures and micro-lenses fabricated using Laser Direct Writing (LDW). The single-wavelength AR coating produced using ALD successfully reduced reflection from 3.3 % to 0.1 % at 633 nm for one surface of SZ2080™.
(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.
D. Astrauskytė, K. Galvanauskas, D. Gailevičius, M. Drazdys, M. Malinauskas, and L. Grineviciute "Deposition of antireflective coatings on 3D micro-optics using atomic layer deposition", Proc. SPIE 12796, Functional Material Applications: From Energy to Sensing, 1279609 (30 November 2023); https://doi.org/10.1117/12.2690946
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Atomic layer deposition

Antireflective coatings

Coating

Thin films

Thin film deposition

Plasma

Micro optics

Back to Top