Divide et impera: a short talk about the importance of feature and model engineering

Jacob König-Otto; Stefan Meusemann

doi:10.1117/12.2673254

5 October 2023 Divide et impera: a short talk about the importance of feature and model engineering

Jacob König-Otto, Stefan Meusemann

Proceedings Volume 12802, 38th European Mask and Lithography Conference (EMLC 2023); 128020I (2023) https://doi.org/10.1117/12.2673254
Event: 38th European Mask and Lithography Conference, 2023, Dresden, Germany

Abstract

The Advanced Mask Technology Center (AMTC) is a joint venture of GlobalFoundries and Toppan Photomasks. AMTC delivers supreme quality photo masks for an enormous variety of different products. To compete with the constantly increasing quality requirements, data pre-processing becomes more and more a key component to reach required yield performances. To reach the quality requirements for the critical dimension (CD) of our masks we predict correction maps in order to improve CD uniformity and a process bias to improve CD mean to nominal (MTN). The process bias is defined as the difference of written structure size to the final structure dimensions on the completed mask. In this talk we present our path to our first machine learning based process bias model with an overall improvement of CD mean to nominal capability of around 30%. We take a closer look on model performance depending on the general model and feature design.

Citation Download Citation

Jacob König-Otto and Stefan Meusemann "Divide et impera: a short talk about the importance of feature and model engineering", Proc. SPIE 12802, 38th European Mask and Lithography Conference (EMLC 2023), 128020I (5 October 2023); https://doi.org/10.1117/12.2673254

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