Evaluating the probabilistic process window for use in high volume manufacturing

Tsu-Wen Huang; Ken-Huan Ho; Cheng-Wei Yang; Yao-Hsiung Kung; Lin-Chin Su; Chris A. Mack

doi:10.1117/12.3011706

9 April 2024 Evaluating the probabilistic process window for use in high volume manufacturing

Tsu-Wen Huang, Ken-Huan Ho, Cheng-Wei Yang, Yao-Hsiung Kung, Lin-Chin Su, Chris A. Mack

Proceedings Volume 12955, Metrology, Inspection, and Process Control XXXVIII; 129551A (2024) https://doi.org/10.1117/12.3011706
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Abstract

Background: Process window metrology is used in manufacturing to determine best dose and focus for the scanner, but current metrology uses defect inspection to determine best focus and thus is expensive and time consuming. Aim: Ideally, an alternate stochastics metric (such as linewidth roughness for line/space patterns) could be used as a substitute for defectivity measurements, saving time and money. Approach: Here, the Probabilistic Process Window (PPW) is evaluated as an improved alternative to the plan of record approach, where only CD-SEM images are collected and evaluated. Results: The PPW was found to provide results that matched to the plan of record approach, but with increased rigor and improved precision. Conclusions: As a result, critical layers on future DRAM manufacturing nodes will use the PPW for best dose/focus scanner control.

Conference Presentation

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Tsu-Wen Huang, Ken-Huan Ho, Cheng-Wei Yang, Yao-Hsiung Kung, Lin-Chin Su, and Chris A. Mack "Evaluating the probabilistic process window for use in high volume manufacturing", Proc. SPIE 12955, Metrology, Inspection, and Process Control XXXVIII, 129551A (9 April 2024); https://doi.org/10.1117/12.3011706

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