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10 April 2024 The opportunities and challenges in optical and patterning materials for augmented reality displays
Mansour Moinpour
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Proceedings Volume 12957, Advances in Patterning Materials and Processes XLI; 129570K (2024) https://doi.org/10.1117/12.3010190
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States
Abstract
Advancements in Augmented Reality/Virtual Reality technology have increased the demand for methods of printing three-dimensional structures. In this contribution we will talk about these technology improvements applied to Surface Relief Gratings – considering photoresists and Nanoimprint layer materials for making a grating, as well as Gap Fill materials for adjusting the refractive index (RI). We will discuss in detail a developed positive tone, i-line photoresist formulation which has been developed for greyscale lithography. We will introduce a range of nanoimprint materials and show the developments of our Ink Jet Printable (IJP) low absorption, high RI gap fill formulations. These innovative formulations are made possible by utilizing a unique precursor and employing special process conditions for optical grating applications.
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Mansour Moinpour "The opportunities and challenges in optical and patterning materials for augmented reality displays", Proc. SPIE 12957, Advances in Patterning Materials and Processes XLI, 129570K (10 April 2024); https://doi.org/10.1117/12.3010190
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KEYWORDS
Optical lithography
Augmented reality
Optical gratings
Photoresist materials
Refractive index
Nanoimprint lithography
Photoresist developing
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