Paper
24 June 2024 Improved polychromatic optical monitoring strategies of thin-film optical filters
Lucas Arsac, Fabien Lemarchand, Detlef Arhilger, Harro Hagedorn, Janis Zideluns, Julien Lumeau
Author Affiliations +
Abstract
Optical interference filters allow achieving a wide range of spectral functions. To match with the theoretical performances, fabrication processes require accurate control of each of the layers’ thicknesses and precise refractive index knowledge. However, despite highly stable deposition process, thickness errors tend to accumulate as the number of deposited layers increases, which in turn can lead to severe degradation of the spectral response. Optical monitoring is one the common techniques used to reduce layer thickness errors during deposition. It consists of measuring the filter transmittance, at one or several monitoring wavelengths, and studying its variation during the whole deposition process. Those signals give real-time information on the spectral performances, and in turns, on the deposited optical thickness of the layers. Indeed, for a given filter, the monitoring system can compute the theoretical optical signal during the process and compare it with real-time measurement. Algorithms implemented in this system are then able to at least partially compensate thickness errors from the previous layers, by correcting the expected cut-off points for the current and next layers. In this study, we investigated a specific optical monitoring technique: polychromatic monitoring. This technique uses multiple wavelengths to monitor the layers’ deposition, instead of a unique wavelength for all layers such as conventional monochromatic monitoring. To evaluate the performance of this technique, we designed a numerical model to simulate the online monitoring signals during deposition, based on filter design and refractive index dispersion of the materials. Then, we developed an algorithm that applies several criteria on those simulated signals to automatically determine the most relevant wavelengths to monitor the filter layers - that is to say the ones that are expected to reduce layer thickness error during the deposition process. We also discuss the difficulties and limits when implementing such an approach, such as measured transmission errors or the critical instant for changing optical testglass. Afterwards, we experimentally tested these algorithms of determination of monitoring strategy on an error-sensitive multi-cavity bandpass filter.
© (2024) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Lucas Arsac, Fabien Lemarchand, Detlef Arhilger, Harro Hagedorn, Janis Zideluns, and Julien Lumeau "Improved polychromatic optical monitoring strategies of thin-film optical filters", Proc. SPIE 13020, Advances in Optical Thin Films VIII, 130200Y (24 June 2024); https://doi.org/10.1117/12.3017181
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Bandpass filters

Transmittance

Optical filters

Refractive index

Error analysis

Design

Algorithm development

RELATED CONTENT

Design and pre-production analysis of optical coatings
Proceedings of SPIE (September 23 2015)
Non-polarizing filter design
Proceedings of SPIE (December 08 2004)
Modeling of optical guided-wave filters
Proceedings of SPIE (June 18 2002)
On the influence of optical accuracy of the band pass...
Proceedings of SPIE (December 14 2010)
Laser trimming of thin-film filters
Proceedings of SPIE (October 04 2005)

Back to Top