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The research focuses on enhancing light absorption in thin silicon solar cells through the integration of photonic nanostructures on the front surface. Departing from conventional micron-scale random pyramids, this work employs nanoimprint lithography (NIL) and two etching methods (reactive-ion and wet chemical) to fabricate "bowl" and inverted pyramid profiles. NIL demonstrates superior nanopattern uniformity, and both structures exhibit enhanced light absorption in longer wavelengths compared to random pyramids. The electrical properties of nanotextured substrates are meticulously investigated due to their potential impact on solar cell performance. Integration of nanostructures into 40-μm-thin crystalline silicon substrates involve protective dielectric layer stacks to ensure survival during wet chemical etching steps. The study underscores the intertwined influence of front and rear-side surface textures on light absorption. While the integration of nanostructures enhances light absorption in 40-μm-thin silicon solar cells, the efforts are directed towards improving electrical performance. This research contributes to the continual optimization of thin silicon solar cells in the photovoltaic industry. |
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Silicon
Solar cells
Nanoimprint lithography
Absorption
Nanostructures
Etching
Semiconducting wafers
