Simultaneous measurement of refractive index and thickness of thin film by polarized reflectances

Tami Kihara; Kiyoshi Yokomori

doi:10.1117/12.51136

1 January 1991 Simultaneous measurement of refractive index and thickness of thin film by polarized reflectances

Tami Kihara, Kiyoshi Yokomori

Proceedings Volume 1332, Optical Testing and Metrology III: Recent Advances in Industrial Optical Inspection; (1991) https://doi.org/10.1117/12.51136
Event: 34th Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, 1990, San Diego, CA, United States

Abstract

A new technique to obtain the refractive index and thickness of a thin film simultaneously is presented. The reflectances of p polarized light and s polarized light are measured at various angles of incidence, and by a numerical procedure, the film index and thickness are extracted from the measured reflectances. The measurement and numerical procedure to determine the film index and thickness are simple and the obtained values are accurate. As an example, we made measurements on a single layer film (SiOJSi) and a double layer film (SiON/Si02/Si), and confirmed the obtained values were consistent.

Citation Download Citation

Tami Kihara and Kiyoshi Yokomori "Simultaneous measurement of refractive index and thickness of thin film by polarized reflectances", Proc. SPIE 1332, Optical Testing and Metrology III: Recent Advances in Industrial Optical Inspection, (1 January 1991); https://doi.org/10.1117/12.51136

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