The effect of laser annealing on laser induced damage threshold

N. C. Kerr

doi:10.1117/12.2294425

1 November 1990 The effect of laser annealing on laser induced damage threshold

N. C. Kerr

Proceedings Volume 1438, Laser-Induced Damage in Optical Materials 1989; 14380G (1990) https://doi.org/10.1117/12.2294425
Event: Laser-Induced Damage in Optical Materials 1989, 1989, Boulder, CO, United States

Abstract

A significant enhancement of the single shot Laser Induced Damage Threshold of CaF2 and fused silica and a moderate enhancement for GaAs and Al has been observed as the result of laser annealing using an excimer laser operating at 248 nm. This phenomenon is primarily attributed to a reduction of the residual surface roughness of the samples.

Citation Download Citation

N. C. Kerr "The effect of laser annealing on laser induced damage threshold", Proc. SPIE 1438, Laser-Induced Damage in Optical Materials 1989, 14380G (1 November 1990); https://doi.org/10.1117/12.2294425

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