Paper
1 July 1991 Fabrication of multiphase optical elements for weighted array spot generation
Paul McKee, David Wood, Mark P. Dames, C. Dix
Author Affiliations +
Proceedings Volume 1461, Practical Holography V; (1991) https://doi.org/10.1117/12.44706
Event: Electronic Imaging '91, 1991, San Jose, CA, United States
Abstract
Techniques have been developed for the design and fabrication of surface relief holographic optical elements used to split single beams into multiple beams, of either equal or unequal intensities. The designs were fabricated as chrome on glass masters by standard electron beam mask-making techniques. Patterns were transferred using photolithography and reactive ion etching to form the required relief image in quartz. Binary phase holograms have been fabricated with measured efficiencies of around 70% for a range of uniform split arrays up to 20 X 20 with beam intensity ratios within 1% of the design values. Weight matrix holograms, both binary phase inversion symmetric and 4 phase non-inversion symmetric, have been fabricated with a similar measured efficiency.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Paul McKee, David Wood, Mark P. Dames, and C. Dix "Fabrication of multiphase optical elements for weighted array spot generation", Proc. SPIE 1461, Practical Holography V, (1 July 1991); https://doi.org/10.1117/12.44706
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KEYWORDS
Etching

Holograms

Beam splitters

Optical design

Quartz

Reactive ion etching

Binary data

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