High-speed stepper setup using a low-voltage SEM

Jozef P. H. Benschop; Kevin M. Monahan; Tom A. Harris

doi:10.1117/12.44424

1 July 1991 High-speed stepper setup using a low-voltage SEM

Jozef P. H. Benschop, Kevin M. Monahan, Tom A. Harris

Proceedings Volume 1464, Integrated Circuit Metrology, Inspection, and Process Control V; (1991) https://doi.org/10.1117/12.44424
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

Under low dose conditions, low-voltage SEMs can measure the bottom width of a resist profile accurately over a wide range of resist side wall angles, thus allowing a accurate, precise and fast measurement of focus-exposure matrices. It is also shown that the measured data fits a fixed parameter model well. By means of statistically leveraged experimental design techniques, a robust focus-exposure-response surface may be generated with as few as nine measurements. This approach greatly reduces measurement time, resulting in high-speed stepper setup. Results are shown for different experimental designs and different low- and-high voltage SEMs.

Citation Download Citation

Jozef P. H. Benschop, Kevin M. Monahan, and Tom A. Harris "High-speed stepper setup using a low-voltage SEM", Proc. SPIE 1464, Integrated Circuit Metrology, Inspection, and Process Control V, (1 July 1991); https://doi.org/10.1117/12.44424

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