Novel toroidal mirror enhances x-ray lithography beamline at the Center for X-ray Lithography

Richard K. Cole; Franco Cerrina

doi:10.1117/12.47348

1 August 1991 Novel toroidal mirror enhances x-ray lithography beamline at the Center for X-ray Lithography

Richard K. Cole, Franco Cerrina

Proceedings Volume 1465, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing; (1991) https://doi.org/10.1117/12.47348
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

An unique lithography beamline is described that delivers x-rays using a flexible arrangement of two toroidal mirrors providing high spectral and spatial uniformity at the wafer plane. The image produced is a thin, scannable, horizontal line suitable for exposing a 25 nm X 50 nm field, compatible with submicron ULSI. The authors also present the current status of such a beamline currently under construction at CXrL for use with the Silicon Valley Group Lithography, Inc.'s 0.25 micron x-ray stepper.

Citation Download Citation

Richard K. Cole and Franco Cerrina "Novel toroidal mirror enhances x-ray lithography beamline at the Center for X-ray Lithography", Proc. SPIE 1465, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing, (1 August 1991); https://doi.org/10.1117/12.47348

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