Paper
1 November 1991 Small polaron conduction in amorphous CoMnNiO thin film
Hui Tan, Mingde Tao, Dong Gin, Ying Han, Chenglu Lin
Author Affiliations +
Proceedings Volume 1519, International Conference on Thin Film Physics and Applications; (1991) https://doi.org/10.1117/12.47199
Event: International Conference on Thin Film Physics and Applications, 1991, Shanghai, China
Abstract
CoMnNiO thin film deposited by rf sputtering is a combination of various amorphous metal oxides. Its DC conductivity changes smoothly with temperature from 173 to 373 K. The relation of AC conductivity with frequency can be written as (sigma) ((omega))∝(omega)s. Its thermopower is positive and its mobility at 330 K is about 1.25 cm2V-1S-1, which is thermally activated. It can be inferred that small polaron conduction is included in the conduction of this amorphous thin film.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hui Tan, Mingde Tao, Dong Gin, Ying Han, and Chenglu Lin "Small polaron conduction in amorphous CoMnNiO thin film", Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); https://doi.org/10.1117/12.47199
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Polarons

Thin films

Temperature metrology

Oxides

Physics

Sputter deposition

Thin film deposition

RELATED CONTENT

Chemical spray deposition of CuGaS2 thin films
Proceedings of SPIE (February 01 1992)
Reactively sputtered thermochromic tungsten doped VO2 films
Proceedings of SPIE (September 09 1994)
Research on the temperature of thin film under ion beam...
Proceedings of SPIE (November 01 1991)
Pulsed laser deposition of metal oxide films
Proceedings of SPIE (September 14 1998)

Back to Top