Zero-bias PBS process for 5X reticles

Regine G. Tarascon-Auriol; Christophe Pierrat; Michael W. Stohl; Christopher P. Braun; James Burdorf; Sheila Vaidya

doi:10.1117/12.56944

1 January 1992 Zero-bias PBS process for 5X reticles

Regine G. Tarascon-Auriol, Christophe Pierrat, Michael W. Stohl, Christopher P. Braun, James Burdorf, Sheila Vaidya

Proceedings Volume 1604, 11th Annual BACUS Symposium on Photomask Technology; (1992) https://doi.org/10.1117/12.56944
Event: 11th Annual BACUS Symposium on Photomask Technology, 1991, Sunnyvale, CA, United States

Abstract

A set of experiments to identify a zero-bias PBS1 process for 5X reticles is described. Parameters such as electron-beam dose, developer strength, baking mode and development mode have been optimized for unbiased PBS reticles. Line edge quality and defect density data will be presented. No rough edges were detected when reticles were run on KLA 208 type machine with one pixel sensitivity (0.36 pm minimum defect size). Plate quality was characterized by Scanning Electron Microscopy (SEM), optical Critical Dimension (CD) and line-edge roughness measurement techniques using Leica Laser Measurement System (LMS 2000) and Etec MEBESIII. It appears that the proposed benefits of biased processes over unbiased ones, namely smoother edge quality and lower defect density, have been overcome by the improvements in the processes, the quality of the raw materials and cleanroom facilities and practices. Statistical data on these parameters will be presented.

Citation Download Citation

Regine G. Tarascon-Auriol, Christophe Pierrat, Michael W. Stohl, Christopher P. Braun, James Burdorf, and Sheila Vaidya "Zero-bias PBS process for 5X reticles", Proc. SPIE 1604, 11th Annual BACUS Symposium on Photomask Technology, (1 January 1992); https://doi.org/10.1117/12.56944

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