Solid state laser for photolithography

Nikolay Andreev; A. A. Babin; Nikita M. Bityurin; Guerman A. Pasmanik; Efim A. Khazanov; Felix I. Feldchtein

doi:10.1117/12.130375

1 June 1992 Solid state laser for photolithography

Nikolay Andreev, A. A. Babin, Nikita M. Bityurin, Guerman A. Pasmanik, Efim A. Khazanov, Felix I. Feldchtein

Proceedings Volume 1674, Optical/Laser Microlithography V; (1992) https://doi.org/10.1117/12.130375
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

In present time six types or siliconorganic materials are commonly used in microelectronic. tecImolog: polysiloxanes, polysilozanes , polysilmethylenes , polysilphenylenes , organic polymers with silicon getheroathoms and polysilanes [1 ] .

Citation Download Citation

Nikolay Andreev, A. A. Babin, Nikita M. Bityurin, Guerman A. Pasmanik, Efim A. Khazanov, and Felix I. Feldchtein "Solid state laser for photolithography", Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); https://doi.org/10.1117/12.130375

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