Electrogravimetric and stress measurements of ion intercalation in NiOx thin films

I. C. de Faria; R. M. Torresi; Annette Gorenstein

doi:10.1117/12.130548

25 November 1992 Electrogravimetric and stress measurements of ion intercalation in NiO_x thin films

I. C. de Faria, R. M. Torresi, Annette Gorenstein

Proceedings Volume 1728, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XI: Chromogenics for Smart Windows; (1992) https://doi.org/10.1117/12.130548
Event: Optical Materials Technology for Energy Efficiency and Solar Energy, 1992, Toulouse-Labege, France

Abstract

The electrochromic properties of transition metal oxides are a consequence of an ion/electron intercalation process. In nickel oxide electrodes, the electrochemical/electrochromic reaction has been pointed out to be a proton/electron intercalation process. However, recent works showed that the mechanism of the reaction could be much more complex. In this work, we studied the electrochemical reactions of rf sputtered thin nickel oxide films in aqueous electrolytes containing different cations. An electrochemical quartz crystal microbalance has been used in order to follow the mass changes during the experiments. Also, the mechanical stress changes have been measured in situ by an optical technique. The results show that the incorporation of the cations in the film has to be considered; possible reaction mechanisms are discussed in this work.

Citation Download Citation

I. C. de Faria, R. M. Torresi, and Annette Gorenstein "Electrogravimetric and stress measurements of ion intercalation in NiO_x thin films", Proc. SPIE 1728, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XI: Chromogenics for Smart Windows, (25 November 1992); https://doi.org/10.1117/12.130548

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