SURPHEXtm: new dry photopolymers for replication of surface relief diffractive optics

Felix P. Shvartsman

doi:10.1117/12.140390

2 March 1993 SURPHEXtm: new dry photopolymers for replication of surface relief diffractive optics

Felix P. Shvartsman

Proceedings Volume 1732, Holographics International '92; (1993) https://doi.org/10.1117/12.140390
Event: Holographics International '92, 1992, London, United Kingdom

Abstract

High efficiency, deep groove, surface relief diffractive optical elements (DOE) with various optical functions can be recorded in a photoresist using conventional interferometric holographic and computer generated photolithographic recording techniques. While photoresist recording media are satisfactory for recording individual surface relief DOE, a reliable and precise method is needed to replicate these diffractive microstructures to maintain the high aspect ratio in each replicated DOE. The term `high aspect ratio' means that the depth of a groove is substantially greater, i.e., 2, 3, or more times greater, then the width of the groove. A new family of dry photopolymers SURPHEX^TM was developed recently at Du Pont to replicate such highly efficient, deep groove DOEs. SURPHEX^TM photopolymers are being utilized in Du Pont's proprietary dry photopolymer embossing (DPE) technology to replicate with a very high degree of precision almost any type of surface relief DOE. Surfaces relief microstructures with a width/depth aspect ratio of 1:20 (0.1 micrometers /2.0micrometers ) were faithfully replicated by DPE technology. Several types of plastic and glass/quartz optical substrates can be used for economical replication of DOE.

Citation Download Citation

Felix P. Shvartsman "SURPHEXtm: new dry photopolymers for replication of surface relief diffractive optics", Proc. SPIE 1732, Holographics International '92, (2 March 1993); https://doi.org/10.1117/12.140390

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