High-threshold fluoride AR coatings for KDP crystal at 352 nm

Takao Izawa; N. Yamamura; R. Uchimura; I. Hashimoto; T. Yakuoh; Kunio Yoshida; Hidetsugu Yoshida

doi:10.1117/12.147437

24 June 1993 High-threshold fluoride AR coatings for KDP crystal at 352 nm

Takao Izawa, N. Yamamura, R. Uchimura, I. Hashimoto, T. Yakuoh, Kunio Yoshida, Hidetsugu Yoshida

Proceedings Volume 1848, 24th Annual Boulder Damage Symposium Proceedings -- Laser-Induced Damage in Optical Materials: 1992; (1993) https://doi.org/10.1117/12.147437
Event: Optical Materials for High Power Lasers, 1992, Boulder, CO, United States

Abstract

The laser damage thresholds and other properties of 352 nm fluoride AR coatings for KDP substrate were investigated. The HoF₃ (or LaF₃)/AlF₃ AR coating deposited by IAD process had a high threshold of 24 J/cm² (10 ns) when the laser conditioning procedure was used. These fluoride ARs were durable for wiping and also did not degrade during more than one year under room atmosphere.

Citation Download Citation

Takao Izawa, N. Yamamura, R. Uchimura, I. Hashimoto, T. Yakuoh, Kunio Yoshida, and Hidetsugu Yoshida "High-threshold fluoride AR coatings for KDP crystal at 352 nm", Proc. SPIE 1848, 24th Annual Boulder Damage Symposium Proceedings -- Laser-Induced Damage in Optical Materials: 1992, (24 June 1993); https://doi.org/10.1117/12.147437

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