Paper
15 September 1993 Scaling law for the dissolution of phenolic resins in aqueous base
Tung-Feng Yeh, Arnost Reiser, Ralph R. Dammel, Georg Pawlowski, Horst Roeschert
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Abstract
A scaling law derived from percolation theory for the dissolution of phenolic resins in aqueous base is tested and confirmed on seven groups of amphiphilic resins. The scaling law can be presented in the dimensionless form: log(R/R1) equals 2 log[(p - pc)/(1 - pc)]. Here R and R1 are the dissolution rates of the resin and of a standard resin for which p equals 1, the percolation parameter, p, linked to the concentration of hydrophilic sites (OH-groups) in the material, and pc is the percolation threshold below which dissolution no longer occurs. In the group of resins of this study Pc equals 0.20. In its dimensionless form the scaling law provides a single function which applies to all resins of this study and, we believe, to amphiphilic resins in general. This allows the prediction of dissolution rates and the selection of polymer structures which are likely to have specified dissolution kinetics.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tung-Feng Yeh, Arnost Reiser, Ralph R. Dammel, Georg Pawlowski, and Horst Roeschert "Scaling law for the dissolution of phenolic resins in aqueous base", Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); https://doi.org/10.1117/12.154792
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Cited by 1 scholarly publication.
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KEYWORDS
Diffusion

Polymers

Solids

Mercury

Semiconducting wafers

Ions

Silicon

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