Paper
8 August 1993 Effect of lens aberration on oblique-illumination stepper system
Pei-yang Yan, Qi-De Qian, Joseph C. Langston
Author Affiliations +
Abstract
In this paper, detailed simulation and some experimental studies on stepper lens aberration effect in the case of oblique illumination source are presented. The results are compared to that of conventional illumination source. Due to the unique feature of oblique illumination source imaging, i.e., imaging by using only zero and first diffraction order light, both stepper resolution limit and depth of focus (DOF) are extended. As a result, the effect of lens aberration in resist printing are also different from that of conventional illumination source. Unlike the conventional illumination source, the net effect of stepper lens aberration in resist printing depends not only on both the amount and type of the lens aberration, but also on the mask feature pattern. In the case of lens distortion, unlike the other types of lens aberration, the oblique illumination source does not show any improvement as compared to that of conventional illumination source. It does not show pattern dependent distortion either. In the experiment, an effect of a stepper lens aberration in resist printing for both conventional illumination and quadrapole illumination sources (mostly astigmatism) were measured. The results were in agreement with our simulation results.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Pei-yang Yan, Qi-De Qian, and Joseph C. Langston "Effect of lens aberration on oblique-illumination stepper system", Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); https://doi.org/10.1117/12.150422
Lens.org Logo
CITATIONS
Cited by 2 scholarly publications and 3 patents.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Monochromatic aberrations

Distortion

Diffraction

Printing

Modulation transfer functions

Critical dimension metrology

Lithographic illumination

RELATED CONTENT


Back to Top