Optimization of excimer laser-induced x-ray sources for soft x-ray projection lithography

Fred Bijkerk; Leonid A. Shmaenok; Eric Louis; A. van Honk; Marnix J. van der Wiel; Y. Y. Platonova; Alexander P. Shevelko; Alexander V. Mitrofanov; Frank Voss; R. Desor; Helmut Frowein; Bernard K. Nikolaus

doi:10.1117/12.167989

1 February 1994 Optimization of excimer laser-induced x-ray sources for soft x-ray projection lithography

Fred Bijkerk, Leonid A. Shmaenok, Eric Louis, A. van Honk, Marnix J. van der Wiel, Y. Y. Platonova, Alexander P. Shevelko, Alexander V. Mitrofanov, Frank Voss, R. Desor, Helmut Frowein, Bernard K. Nikolaus

Author Affiliations +

Proceedings Volume 2015, Applications of Laser Plasma Radiation; (1994) https://doi.org/10.1117/12.167989
Event: SPIE's 1993 International Symposium on Optics, Imaging, and Instrumentation, 1993, San Diego, CA, United States

Abstract

We report results on high power excimer lasers and their application to generating laser plasma soft x-ray sources. A conversion efficiency of laser light to monochromatized soft x- ray radiation of 0.7% has been achieved at 13.5 nm (2% BW). Two methods to mitigate the production of plasma debris have been analyzed: tape targets and the use of Kr as a buffer gas. The optimal coating thickness of tape targets coated with Ta has been determined as 1 micrometers . Ta tape targets and the Kr buffer were used in a debris contamination test of 10⁵ pulses and evaluated by the loss in reflectivity of a normal incidence Mo-Si multilayer mirror.

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Fred Bijkerk, Leonid A. Shmaenok, Eric Louis, A. van Honk, Marnix J. van der Wiel, Y. Y. Platonova, Alexander P. Shevelko, Alexander V. Mitrofanov, Frank Voss, R. Desor, Helmut Frowein, and Bernard K. Nikolaus "Optimization of excimer laser-induced x-ray sources for soft x-ray projection lithography", Proc. SPIE 2015, Applications of Laser Plasma Radiation, (1 February 1994); https://doi.org/10.1117/12.167989

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