Radiation damage effects in far-ultraviolet filters and substrates

Charles E. Keffer; Marsha R. Torr; Muamer Zukic; James F. Spann; Douglas G. Torr; Jongmin Kim

doi:10.1117/12.165218

6 December 1993 Radiation damage effects in far-ultraviolet filters and substrates

Charles E. Keffer, Marsha R. Torr, Muamer Zukic, James F. Spann, Douglas G. Torr, Jongmin Kim

Proceedings Volume 2018, Passive Materials for Optical Elements II; (1993) https://doi.org/10.1117/12.165218
Event: SPIE's 1993 International Symposium on Optics, Imaging, and Instrumentation, 1993, San Diego, CA, United States

Abstract

New advances in VUV thin film filter technology have been made using filter designs with multilayers of materials such as Al₂O₃, BaF₂, CaF₂, HfO₂, LaF₃, MgF₂, and SiO₂. Our immediate application for these filters will be in an imaging system to be flown on a satellite where a 2 X 9 R_E orbit will expose the instrument to approximately 275 krads of radiation. In view of the fact that no previous studies have been made on potential radiation damage of these materials on the thin film format, we report on such an assessment here.

Citation Download Citation

Charles E. Keffer, Marsha R. Torr, Muamer Zukic, James F. Spann, Douglas G. Torr, and Jongmin Kim "Radiation damage effects in far-ultraviolet filters and substrates", Proc. SPIE 2018, Passive Materials for Optical Elements II, (6 December 1993); https://doi.org/10.1117/12.165218

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